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Thin film growth of yttria stabilized zirconia by aerosol assisted chemical vapor deposition

Author   Schlupp, M. V. F.; Prestat, M.; Martynczuk, J.; Rupp, J. L. M.; Bieberle-Huetter, A.; Gauckler, L. J.
Year   2012
Type   Journal Article
Journal   Journal of Power Sources
Volume   202
Pages   47-55
Date   Mar 15
ISSN   0378-7753
Accession Numer   WOS:000300139100006
Abstract   Thin film growth of yttria stabilized zirconia (YSZ) using atmospheric aerosol assisted chemical vapor deposition (AA-CVD) from beta-diketonates is studied. The influence of nature and concentration of metal precursors and solvents on thin film growth, microstructure and composition is investigated as a function of deposition temperature. AA-CVD is able to produce smooth and homogeneous YSZ thin films of controlled thickness and stoichiometry. Amorphous, nanocrystalline or columnar microstructures can be obtained at deposition temperatures between 300 and 650 degrees C. In the same temperature regime, a transition from surface reaction to diffusion controlled film growth is observed. For applications as gas separating membranes, e.g. for micro-solid oxide fuel cell electrolytes, randomly oriented nanocrystalline microstructures with grain sizes in the range of 10 nm are promising. (C) 2011 Elsevier B.V. All rights reserved.
Notes   Times Cited: 0
URL   Access publication [Website]
Record Number   779
Group   nonmet

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